Masashi Enomoto
at Tokyo Electron Europe Ltd
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 20 March 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Oxides, Contamination, Etching, Metals, Photoresist materials, Extreme ultraviolet lithography, Thin film coatings, Semiconducting wafers, Photoresist developing, Tin

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Contamination, Silica, Scanners, Particles, Critical dimension metrology, Thin film coatings, Photoresist processing, Semiconducting wafers, Particle contamination

Proceedings Article | 31 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Manufacturing, Scanning electron microscopy, Scatterometry, Critical dimension metrology, Photomicroscopy, Thin film coatings, Photoresist processing, Semiconducting wafers, Optical calibration

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Contamination, Etching, Polymers, Scanners, Particles, Bridges, Critical dimension metrology, Photomicroscopy, Photoresist processing, Semiconducting wafers

Proceedings Article | 4 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Metrology, Scanners, Particles, Manufacturing, Inspection, Bridges, High volume manufacturing, Critical dimension metrology, Semiconducting wafers, Standards development

Showing 5 of 10 publications
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