Masashi Fujimoto
at DNP Fine Electronics Sagamihara Co Ltd
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 31 October 2007 Paper
Paul van Adrichem, Masashi Fujimoto, Ingo Bork, Hiroshi Yamashita, Anthony Chunqing Wang
Proceedings Volume 6730, 673059 (2007) https://doi.org/10.1117/12.746838
KEYWORDS: Calibration, Optical proximity correction, Process modeling, Metrology, Data modeling, Scanning electron microscopy, Mathematical modeling, Edge roughness, Lithography, Statistical modeling

Proceedings Article | 24 July 2002 Paper
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474259
KEYWORDS: Transparency, Etching, Photoresist processing, Dielectrics, Scanning electron microscopy, Absorbance, Optical lithography, Polymers, Lithography, Copper

Proceedings Article | 14 September 2001 Paper
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435768
KEYWORDS: Photomasks, Critical dimension metrology, Lithography, Scanners, Semiconducting wafers, Monochromatic aberrations, Electroluminescence, Binary data, Control systems, Inspection

Proceedings Article | 5 July 2000 Paper
Takeo Hashimoto, Masashi Fujimoto, Tamio Yamazaki
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388946
KEYWORDS: Critical dimension metrology, Photoresist processing, Photomasks, Semiconducting wafers, Scanners, Lithography, Image resolution, Cadmium, Image processing, Imaging systems

Proceedings Article | 29 June 1998 Paper
Seiji Matsuura, Takayuki Uchiyama, Kunihiko Kasama, Masashi Fujimoto, Takeo Hashimoto, Tamio Yamazaki
Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310802
KEYWORDS: Critical dimension metrology, Optical lithography, Tolerancing, Reticles, Scanners, Excimer lasers, Distortion, Chemical analysis, Image resolution, Error analysis

Showing 5 of 11 publications
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