Masashi Fujimoto
at DNP Fine Electronics Sagamihara Co Ltd
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 31 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Mathematical modeling, Lithography, Metrology, Data modeling, Calibration, Scanning electron microscopy, Optical proximity correction, Statistical modeling, Process modeling, Edge roughness

Proceedings Article | 24 July 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Transparency, Optical lithography, Etching, Polymers, Copper, Dielectrics, Scanning electron microscopy, Absorbance, Photoresist processing

Proceedings Article | 14 September 2001
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Lithography, Monochromatic aberrations, Scanners, Inspection, Control systems, Electroluminescence, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data

Proceedings Article | 5 July 2000
Proc. SPIE. 4000, Optical Microlithography XIII
KEYWORDS: Lithography, Cadmium, Imaging systems, Image processing, Scanners, Image resolution, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 29 June 1998
Proc. SPIE. 3334, Optical Microlithography XI
KEYWORDS: Reticles, Optical lithography, Scanners, Error analysis, Image resolution, Distortion, Excimer lasers, Chemical analysis, Critical dimension metrology, Tolerancing

Showing 5 of 11 publications
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