Masato Saito
at Toshiba Corp
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 5 October 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Optical lithography, Etching, X-rays, Image quality, Double patterning technology, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Defect inspection

Proceedings Article | 10 May 2016 Paper
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Optical lithography, Etching, Dry etching, Image processing, Scanning electron microscopy, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Vestigial sideband modulation

Proceedings Article | 1 April 2016 Paper
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Semiconductors, Lithography, Backscatter, Solids, Photomasks, Beam shaping, Nanoimprint lithography, Data conversion, Photoresist processing

Proceedings Article | 28 July 2014 Paper
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Lithography, Optical lithography, Error analysis, Scanning electron microscopy, Photomasks, Beam shaping, Double patterning technology, Mask making, Photoresist processing, Vestigial sideband modulation

Proceedings Article | 9 September 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Optical design, Optical lithography, Image analysis, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Vestigial sideband modulation

Showing 5 of 11 publications
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