Prof. Masato Shibuya
Professor at Tokyo Polytechnic Univ
SPIE Involvement:
Fellow status | Conference Program Committee | Conference Co-Chair | Author
Publications (34)

PROCEEDINGS ARTICLE | February 22, 2018
Proc. SPIE. 10528, Optical Components and Materials XV
KEYWORDS: Monochromatic aberrations, Refractive index, Optical design, Prisms, Sun, Diffractive optical elements, Fresnel lenses, Geometrical optics, Spherical lenses, Precision optics

PROCEEDINGS ARTICLE | February 19, 2018
Proc. SPIE. 10556, Advances in Display Technologies VIII
KEYWORDS: Optical filters, Light emitting diodes, Printing, LCDs, Televisions, Light sources and illumination, Translucency, Color reproduction

SPIE Journal Paper | August 21, 2017
OE Vol. 56 Issue 08
KEYWORDS: Statistical analysis, Zernike polynomials, Modulation transfer functions, Mathematical modeling, Image analysis, Tolerancing, Point spread functions, Optics manufacturing, Optical design, Optical engineering

SPIE Journal Paper | December 28, 2016
OE Vol. 55 Issue 12
KEYWORDS: Monochromatic aberrations, Optical design, Wavefront aberrations, Extreme ultraviolet lithography, Wavefronts, Zernike polynomials, Reflectivity, Cameras, Optical engineering, Aberration theory

SPIE Journal Paper | March 31, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Photomasks, Manufacturing, Optical lithography, Nanoimprint lithography, Optical proximity correction, Nanotechnology, Printing, Semiconductor lasers, Semiconductors, Extreme ultraviolet

SPIE Journal Paper | March 4, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Projection systems, Image processing, Fourier transforms, Optical spheres, Diffraction, Photomasks, Wave propagation, Optical lithography, Lithography, Radio propagation

Showing 5 of 34 publications
Conference Committee Involvement (4)
Optical Design and Testing III
12 November 2007 | Beijing, China
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
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