Masatoshi Terayama
at Toshiba Corp
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | June 30, 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Lithography, Deep ultraviolet, Scanners, Particles, Error analysis, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Non-optical lithography

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Spatial frequencies, Ions, Fourier transforms, Scanning electron microscopy, Photomasks, Line width roughness, Critical dimension metrology, Line edge roughness, Halftones, Photoresist processing

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Sensors, Metals, Particles, Error analysis, Control systems, Atomic force microscopy, Temperature sensors, Mask making, Polonium, Liquids

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