Mr. Masayoshi Mori
at Renesas Technology Corp
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Metrology, Data storage, Metals, Inspection, Printing, Photomasks, Data conversion, Data storage servers, Standards development, Vestigial sideband modulation

PROCEEDINGS ARTICLE | May 15, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Mirrors, Reticles, Polishing, Data modeling, Manufacturing, Design for manufacturing, Photomasks, Data conversion, Product engineering, Binary data

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Interfaces, Manufacturing, Inspection, Control systems, Integration, Photomasks, Optical proximity correction, Mask making, System integration, Semiconducting wafers

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