Masayoshi Mori
at Renesas Technology Corp
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Data conversion, Inspection, Photomasks, Data storage servers, Standards development, Vestigial sideband modulation, Data storage, Metals, Metrology, Printing

Proceedings Article | 15 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Photomasks, Binary data, Reticles, Manufacturing, Mirrors, Design for manufacturing, Data conversion, Data modeling, Product engineering, Polishing

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Photomasks, Manufacturing, System integration, Semiconducting wafers, Integration, Control systems, Mask making, Interfaces, Optical proximity correction, Inspection

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top