Mr. Masayuki Hatano
at Toshiba Corp
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | May 2, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Lithography, Optical lithography, Particles, Distortion, Extreme ultraviolet lithography, Nanoimprint lithography, Optical alignment, Photoresist processing, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 21, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Ultraviolet radiation, Interfaces, Diffusion, Nanoimprint lithography, Photoresist processing, Liquids

PROCEEDINGS ARTICLE | March 21, 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Semiconductors, Nanotechnology, Lithography, Optical lithography, Particles, Inspection, Distortion, Nanoimprint lithography, Optical alignment, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 22, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Semiconductors, Lithography, Contamination, Defect detection, Image processing, Silicon, Process control, Photomasks, Chemical analysis, Extreme ultraviolet lithography, Nanoimprint lithography, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Industrial chemicals

PROCEEDINGS ARTICLE | March 22, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Semiconductors, Lithography, Optical lithography, Calibration, Ultraviolet radiation, Computer simulations, Design for manufacturing, Double patterning technology, Computational lithography, Nanoimprint lithography, Photoresist processing, Optics manufacturing, Nanolithography, Design for manufacturability

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Semiconductors, Lithography, Optical lithography, Ultraviolet radiation, Manufacturing, Design for manufacturing, Directed self assembly, Source mask optimization, Computational lithography, Photoresist processing

Showing 5 of 7 publications
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