Mr. Masayuki Kagawa
at Toppan Photomasks Inc
SPIE Involvement:
Author
Publications (12)

PROCEEDINGS ARTICLE | October 4, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Electron beam lithography, Electrons, Manufacturing, Inspection, Image resolution, Photomasks, Extreme ultraviolet, SRAF, Line edge roughness, EUV optics

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Optical lithography, Phase contrast, Sensors, Metals, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Signal detection, Defect inspection

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Logic, Opacity, Etching, Inspection, Chromium, Attenuators, Photomasks, SRAF, Phase shifts

SPIE Journal Paper | February 15, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Roads

SPIE Journal Paper | February 2, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Optical lithography, Photomasks, Inspection, Sensors, Extreme ultraviolet, Scanning electron microscopy, Extreme ultraviolet lithography, Defect inspection, Signal detection, Metals

SPIE Journal Paper | February 1, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Defect detection, Scanning electron microscopy, Extreme ultraviolet lithography, Wafer inspection, Multilayers, Visibility, Overlay metrology

Showing 5 of 12 publications
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