CONFERENCE PROCEEDINGS
Advanced Search >
Masayuki Miyake
at JSR Micro NV
SPIE Involvement:
Author
Publications (2)
PROCEEDINGS ARTICLE | March 27, 2018
EUV resist sensitization and roughness improvement by PSCAR with in-line UV flood exposure system
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Calibration, Polymers, Ultraviolet radiation, Extreme ultraviolet, Image enhancement, Extreme ultraviolet lithography, Picosecond phenomena, Floods, Absorption, Chemically amplified resists
PROCEEDINGS ARTICLE | March 27, 2018
Constructing a robust PSCAR process for EUV
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Image processing, Ultraviolet radiation, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Picosecond phenomena, Line edge roughness, Absorption, Chemically amplified resists
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Back to Top