Mr. Masayuki Miyake Profile

Masayuki Miyake

at JSR Micro NV

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Author

Publications (2)

Proceedings Article | 27 March 2018 Presentation + Paper

EUV resist sensitization and roughness improvement by PSCAR with in-line UV flood exposure system

Seiji Nagahara, Michael Carcasi, Gosuke Shiraishi, Yuya Kamei, Kathleen Nafus, Yukie Minekawa, Hiroyuki Ide, Yoshihiro Kondo, Takahiro Shiozawa, Keisuke Yoshida, Masashi Enomoto, Kosuke Yoshihara, Hideo Nakashima, Serge Biesemans, Ryo Shimada, Masaru Tomono, Kazuhiro Takeshita, Teruhiko Moriya, Hayakawa Makoto, Ryo Aizawa, Yoshitaka Konishi, Masafumi Hori, Ken Maruyama, Hisashi Nakagawa, Masayuki Miyake, Tomoki Nagai, Satoshi Dei, Takehiko Naruoka, Motoyuki Shima, Toru Kimura, Geert Vandenberghe, John Petersen, Danilo De Simone, Foubert Philippe, Hans-Jürgen Stock, Balint Meliorisz, Akihiro Oshima, Seiichi Tagawa

Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV

KEYWORDS: Calibration, Polymers, Ultraviolet radiation, Extreme ultraviolet, Image enhancement, Extreme ultraviolet lithography, Picosecond phenomena, Floods, Absorption, Chemically amplified resists

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Proceedings Article | 27 March 2018 Presentation + Paper

Constructing a robust PSCAR process for EUV

Michael Carcasi, Seiji Nagahara, Gosuke Shiraishi, Yukie Minekawa, Hiroyuki Ide, Yoshihiro Kondo, Kosuke Yoshihara, Masaru Tomono, Ryo Shimada, Kazuhiro Takeshita, Teruhiko Moriya, Yuya Kamei, Kathleen Nafus, Serge Biesemans, Hideo Nakashima, Masafumi Hori, Ken Maruyama, Hisashi Nakagawa, Tomoki Nagai, Satoshi Dei, Masayuki Miyake, Takehiko Naruoka, Motoyuki Shima, Geert Vandenberghe, Danilo De Simone, Philippe Foubert, John Petersen, Akihiro Oshima, Seiichi Tagawa

Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX

KEYWORDS: Optical lithography, Image processing, Ultraviolet radiation, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Picosecond phenomena, Line edge roughness, Absorption, Chemically amplified resists

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