Masayuki Tomoyasu
Chief Engineer at Tokyo Electron Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 17, 2012
Proc. SPIE. 8328, Advanced Etch Technology for Nanopatterning
KEYWORDS: Ultraviolet radiation, Dielectrics, Ions, Silicon, Nitrogen, Oxygen, Synchrotrons, Vacuum ultraviolet, Plasma systems, Plasma

PROCEEDINGS ARTICLE | May 19, 2011
Proc. SPIE. 8077, Damage to VUV, EUV, and X-ray Optics III
KEYWORDS: Glasses, Ultraviolet radiation, Particles, Dielectrics, Ions, Silicon, Vacuum ultraviolet, Semiconducting wafers, Plasma systems, Plasma

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Metrology, Calibration, Etching, Error analysis, Silicon, Silver, Control systems, Photomasks, Critical dimension metrology, Semiconducting wafers

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