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Masumi Shirai
at Hitachi High-Tech Corp
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Author
Publications (1)
Proceedings Article | 30 March 2020 Presentation + Paper
High-accuracy, high-speed, and smart metrology in the EUV era
Proceedings Volume 11325, 113251Q (2020) https://doi.org/10.1117/12.2551868
KEYWORDS: Metrology, Extreme ultraviolet, Scanning electron microscopy, Artificial intelligence, Image processing, Semiconducting wafers, Stochastic processes, Critical dimension metrology, Error analysis, Inspection
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