Dr. Mathew Zablocki Profile

Dr. Mathew Zablocki

Director of Photonic Applications at Univ. of Delaware

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Author

Publications (11)

Proceedings Article | 8 May 2018 Paper

Thin-film coating of vibro-fluidized microparticles via R. F. Magnetron sputtering

Nicholas Hudak, Benjamin Garrett, Mathew Zablocki, Timothy Creazzo, Ahmed Sharkawy, Brendan DeLacy, Mark Mirotznik

Proceedings Volume 10639, 106392M (2018) https://doi.org/10.1117/12.2300265

KEYWORDS: Particles, Aluminum, Coating, Long wavelength infrared, Optical spheres, Thin films, Sputter deposition, Polymers, Scanning electron microscopy, Glasses

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Proceedings Article | 7 March 2014 Paper

Dual slot modulator for millimeter wave photonics

Matthew Konkol, Stephen Kozacik, David L. Eng, Brock Overmiller, Mathew Zablocki, Benjamin Olbricht, Janusz Murakowski, Shouyuan Shi, Ahmed Sharkawy, Dennis Prather

Proceedings Volume 8983, 898317 (2014) https://doi.org/10.1117/12.2038208

KEYWORDS: Silicon, Modulators, Modulation, Waveguides, Electro optics, Electrodes, Dielectrics, Extremely high frequency, Photonics, Titanium dioxide

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Proceedings Article | 27 March 2013 Paper

Progress towards dual vertical slot modulator for millimeter wave photonics

Stephen Kozacik, Maciej Murakowski, Matthew Konkol, Suman Addya, David L. Eng, Benjamin Olbricht, Mathew Zablocki, Ahmed Sharkawy, Janusz Murakowski, Shouyuan Shi, Dennis Prather

Proceedings Volume 8624, 86240Y (2013) https://doi.org/10.1117/12.2004978

KEYWORDS: Silicon, Waveguides, Modulators, Etching, Electron beam lithography, Photomasks, Optical alignment, Lithography, Photonics, Titanium dioxide

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Proceedings Article | 21 May 2011 Paper

Modeling of hybrid organic/inorganic dual RF-photonic slot waveguide modulator

Shouyuan Shi, Ahmed Sharkawy, Mathew Zablocki, Dennis Prather

Proceedings Volume 8060, 80600C (2011) https://doi.org/10.1117/12.887085

KEYWORDS: Waveguides, Modulators, Polymers, Electro optics, Silicon, Modulation, Electrooptic modulators, Signal attenuation, Electrodes, Refractive index

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Proceedings Article | 9 February 2011 Paper

Reconfigurable bi-directional optical routing in photonic crystals enabled by silicon nanomembrane modules

Mathew Zablocki, Ahmed Sharkawy, Dennis Prather

Proceedings Volume 7943, 79430D (2011) https://doi.org/10.1117/12.875270

KEYWORDS: Photonic crystals, Waveguides, Wavelength division multiplexing, Silicon, Chemical elements, Optical interconnects, Light wave propagation, Directional couplers, Dense wavelength division multiplexing, Channel projecting optics

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Proceedings Article | 24 April 2010 Paper

Chemical and biological sensors based on nanomembrane technology

Ozgenc Ebil, Ahmed Sharkawy, Mathew Zablocki, Dennis Prather

Proceedings Volume 7673, 767308 (2010) https://doi.org/10.1117/12.852435

KEYWORDS: Silicon, Sensors, Waveguides, Photonics, Environmental sensing, Crystals, Photonic crystals, Nanotechnology, Biosensing, Etching

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Proceedings Article | 1 March 2010 Paper

Organically enabled silicon-based photonic/RF-photonic applications

Ahmed Sharkawy, Ozgenc Ebil, Peng Yao, Eric Kelmelis, Matthew Zablocki, Shouyuan Shi, Christopher Schuctz, Dennis Prather

Proceedings Volume 7599, 75990L (2010) https://doi.org/10.1117/12.840643

KEYWORDS: Modulators, Modulation, Silicon, Silicon photonics, Polymers, RF photonics, Electro optics, Phased array optics, Photonics, Crystals

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Proceedings Article | 24 February 2010 Paper

Chip-scale photonic interconnects for reconfigurable computing

Ahmed Sharkawy, Ozgenc Ebil, Mathew Zablocki, Shouyuan Shi, Dennis Prather

Proceedings Volume 7609, 76090O (2010) https://doi.org/10.1117/12.842468

KEYWORDS: Photonic crystals, Waveguides, Switches, Signal processing, Field programmable gate arrays, Optical interconnects, Integrated optics, Silicon, Reconfigurable computing, Diodes

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Proceedings Article | 17 February 2010 Paper

Nanomembrane enabled nanophotonic devices

Mathew Zablocki, Ahmed Sharkawy, Ozgenc Ebil, Dennis Prather

Proceedings Volume 7606, 76060V (2010) https://doi.org/10.1117/12.842670

KEYWORDS: Silicon, Photonic crystals, Crystals, Waveguides, Photonics, Signal processing, Photonic devices, Photonic crystal devices, Polymers, Semiconducting wafers

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Proceedings Article | 4 April 2008 Paper

Processing and modeling optimization for grayscale lithography

Thomas Dillon, Mathew Zablocki, Janusz Murakowski, Dennis Prather

Proceedings Volume 6923, 69233B (2008) https://doi.org/10.1117/12.773213

KEYWORDS: Photoresist materials, Photomasks, Photoresist developing, Lithography, Absorbance, Etching, Grayscale lithography, Picture Archiving and Communication System, Glasses, Process modeling

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Proceedings Article | 26 February 2008 Paper

Micromachining of a fiber-to-waveguide coupler using grayscale lithography and through-wafer etch

Thomas Dillon, Mathew Zablocki, Shouyan Shi, Janusz Murakowski, Dennis Prather

Proceedings Volume 6882, 688206 (2008) https://doi.org/10.1117/12.764036

KEYWORDS: Etching, Mirrors, Optical fibers, Waveguides, Semiconducting wafers, Photoresist materials, Silicon, Photomasks, Glasses, Polarization

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For some time, the micro-optics and photonics fields have relied on fabrication processes and technology borrowed from the well-established silicon integrated circuit industry. However, new fabrication methodologies must be developed for greater flexibility in the machining of micro-optic devices. To this end, we have explored grayscale lithography as an enabler for the realization of such devices. This process delivers the ability to sculpt materials arbitrarily in three dimensions, thus providing the flexibility to realize optical surfaces to shape, transform, and redirect the propagation of light efficiently. This has opened the door for new classes of optical devices. As such, we present a fiber-to-waveguide coupling structure utilizing a smoothly contoured lensing surface in the device layer of a silicon-on insulator (SOI) wafer, fabricated using grayscale lithography. The structure collects light incident normally to the wafer from a singlemode optical fiber plugged through the back surface and turns the light into the plane of the device layer, focusing it into a single-mode waveguide. The basis of operation is total internal reflection, and the device therefore has the potential advantages of providing a large bandwidth, low polarization sensitivity, high efficiency, and small footprint. The structure was optimized with a simulated annealing algorithm in conjunction with two-dimensional finite-difference time-domain (FDTD) simulation accelerated on the graphics processing unit (GPU), and achieves a theoretical efficiency of approximately seventy percent, including losses due to Fresnel reflection from the oxide/silicon interface. Initial fabrication results validate the principle of operation. We discuss the grayscale fabrication process as well as the through-wafer etch for mechanical stabilization and alignment of the optical fiber to the coupling structure. Refinement of the through-wafer etch process for high etch rate and appropriate sidewall taper are addressed.

Showing 5 of 11 publications

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