Mr. Mathias Holz Profile

Mathias Holz

at nano analytik GmbH

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 22 February 2021 Presentation + Paper

Nanopositioning and -fabrication using the Nano Fabrication Machine with a positioning range up to Ø 100 mm

Jaqueline Stauffenberg, Christoph Reuter, Ingo Ortlepp, Mathias Holz, Denis Dontsov, Christoph Schäffel, Jens-Peter Zöllner, Ivo Rangelow, Steffen Strehle, Eberhard Manske

Proceedings Volume 11610, 1161016 (2021) https://doi.org/10.1117/12.2583703

KEYWORDS: Nanofabrication, Wheatstone bridges, Statistical analysis, Sensors, Precision measurement, Optical sensors, Nanotechnology, Nanostructures, Manufacturing, Lithography

Read Abstract +

Proceedings Article | 23 March 2020 Paper

Tip- and laser-based nanofabrication up to 100 mm with sub-nanometre precision

Ingo Ortlepp, Michael Kühnel, Martin Hofmann, Laura Weidenfeller, Johannes Kirchner, Shraddha Supreeti, Rostyslav Mastylo, Mathias Holz, Thomas Michels, Roland Füßl, Ivo Rangelow, Thomas Fröhlich, Denis Dontsov, Christoph Schäffel, Eberhard Manske

Proceedings Volume 11324, 113240A (2020) https://doi.org/10.1117/12.2551044

KEYWORDS: Interferometers, Nanofabrication, Mirrors, Actuators, Near field optics, Control systems, Manufacturing, Nanotechnology, Physics, Atomic force microscopy

Read Abstract +

Proceedings Article | 26 September 2019 Paper

Atomic force microscope integrated into a scanning electron microscope for fabrication and metrology at the nanometer scale

Mathias Holz, Christoph Reuter, Alexander Reum, Ahmad Ahmad, Martin Hofmann, Tzvetan Ivanov, Stephan Mechold, Ivo Rangelow

Proceedings Volume 11148, 111481F (2019) https://doi.org/10.1117/12.2537018

KEYWORDS: Scanning electron microscopy, Atomic force microscope, Electron microscopes, Metrology, Electron beams, Nanofabrication, Diamond, Scanning probe lithography, Microscopy, Overlay metrology

Read Abstract +

Proceedings Article | 26 September 2019 Paper

High throughput AFM inspection system with parallel active cantilevers

M. Holz, C. Reuter, A. Reum, A. Ahmad, M. Hofmann, T. Ivanov, I. Rangelow, J. Stauffenberg, E. Manske, C. Du, X. Q. Zhou, N. Okamoto, A. N. Takashima, H. S. Lee

Proceedings Volume 11148, 111481E (2019) https://doi.org/10.1117/12.2537009

KEYWORDS: Inspection, Atomic force microscopy, Chemical mechanical planarization, Actuators, Metrology, Semiconductors, Optical inspection, Charged particle optics, Electron beams, Photomasks

Read Abstract +

Proceedings Article | 26 March 2019 Paper

Parallel active cantilever AFM tool for high-throughput inspection and metrology

Mathias Holz, Christoph Reuter, Ahmad Ahmad, Alexander Reum, Tzvetan Ivanov, Elshad Guliyev, Ivo Rangelow, Ho-Se Lee

Proceedings Volume 10959, 1095929 (2019) https://doi.org/10.1117/12.2515091

KEYWORDS: Metrology, Atomic force microscopy, Inspection, Semiconducting wafers, Actuators, Photomasks, Silicon, Digital signal processing, Field programmable gate arrays, Imaging systems

Read Abstract +

Proceedings Article | 19 March 2018 Presentation + Paper

Field-emission scanning probe lithography with self-actuating and self-sensing cantilevers for devices with single digit nanometer dimensions

Ivo Rangelow, Claudia Lenk , Martin Hofmann , Steve Lenk , Tzvetan Ivanov , Ahmad Ahmad , Marcus Kaestner, Elshad Guliyev, Christoph Reuter, Matthias Budden, Jens-Peter Zöllner, Mathias Holz , Alexander Reum, Zahid Durrani, Mervyn Jones, Cemal Aydogan, Mahmut Bicer, B. Erdem Alaca, Michael Kuehnel, Thomas Fröhlich, Roland Fuessl, E. Manske

Proceedings Volume 10584, 1058406 (2018) https://doi.org/10.1117/12.2299955

KEYWORDS: Silicon, Lithography, Etching, Scanning probe lithography, Cryogenics, Optical alignment, Nanoelectronics, Reactive ion etching, Nanolithography, Electron beam lithography

Read Abstract +

Proceedings Article | 31 January 2018 Paper

Single nano-digit and closed-loop scanning probe lithography for manufacturing of electronic and optical nanodevices

Ivo Rangelow, Claudia Lenk , Martin Hofmann , Tzvetan Ivanov, Steve Lenk, Elshad Guliyev, Marcus Kaestner, Cemal Aydogan, Mahmut Bicer, B. Erdem Alaca, Onur Ates, Hamdi Torun, Arda Yalcinkaya, Ahmad Ahmad, Alexander Reum, Mathias Holz

Proceedings Volume 10456, 1045621 (2018) https://doi.org/10.1117/12.2282606

KEYWORDS: Lithography, Scanning probe lithography, Cryogenics, Etching, Optics manufacturing, Nanostructures, Nanolithography, Optical lithography, Split ring resonators, Image resolution

Read Abstract +

SPIE Journal Paper | 10 June 2015

Advanced electric-field scanning probe lithography on molecular resist using active cantilever

Marcus Kaestner, Cemal Aydogan, Tzvetan Ivanov, Ahmad Ahmad, Tihomir Angelov, Alexander Reum, Valentyn Ishchuk, Yana Krivoshapkina, Manuel Hofer, Steve Lenk, Ivaylo Atanasov, Mathias Holz, Ivo Rangelow

JM3, Vol. 14, Issue 03, 031202, (June 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.031202

KEYWORDS: Scanning probe lithography, Optical lithography, Lithography, Optical alignment, Semiconducting wafers, Atomic force microscopy, Electron beam lithography, Inspection, Navigation systems, Electrons

Read Abstract +

Proceedings Article | 19 March 2015 Paper

Self-actuated, self-sensing cantilever for fast CD measurement

Ahmad Ahmad, Tzvetan Ivanov, Alexander Reum, Elshad Guliyev, Tihomir Angelov, Andreas Schuh, Marcus Kaestner, Ivaylo Atanasov, Manuel Hofer, Mathias Holz, Ivo Rangelow

Proceedings Volume 9424, 94240P (2015) https://doi.org/10.1117/12.2085760

KEYWORDS: Atomic force microscopy, Silicon, Sensors, Metrology, Lithography, Actuators, Amplifiers, 3D metrology, Semiconducting wafers, Scanners

Read Abstract +

Proceedings Article | 17 March 2015 Paper

Advanced electric-field scanning probe lithography on molecular resist using active cantilever

Marcus Kaestner, Cemal Aydogan, Hubert-Seweryn Lipowicz, Tzvetan Ivanov, Steve Lenk, Ahmad Ahmad, Tihomir Angelov, Alexander Reum, Valentyn Ishchuk, Ivaylo Atanasov, Yana Krivoshapkina, Manuel Hofer, Mathias Holz, Ivo Rangelow

Proceedings Volume 9423, 94230E (2015) https://doi.org/10.1117/12.2085846

KEYWORDS: Scanning probe lithography, Lithography, Optical lithography, Electron beam lithography, Optical alignment, Semiconducting wafers, Atomic force microscopy, Inspection, Imaging systems, Control systems

Read Abstract +

Showing 5 of 10 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years