Dr. Mathias Irmscher
Head of Nanopatterning BU at Institut Fuer Mikroelektronik Stuttgart
SPIE Involvement:
Conference Program Committee | Author
Publications (52)

SPIE Journal Paper | 1 August 2017
JM3 Vol. 16 Issue 04

Proceedings Article | 24 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Refractive index, Optical properties, Etching, Metals, X-ray diffraction, Nickel, Cobalt, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 19 March 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Electron beam lithography, Holograms, Diffractive optical elements, Etching, Quartz, Silicon, Photomasks, Nanoimprint lithography, Semiconducting wafers, Vestigial sideband modulation

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Nanostructures, Electron beams, Electronics, Particles, Ions, Silicon, Photomasks, Semiconducting wafers, Nanofabrication

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Oxides, Lithography, Etching, Electrodes, Silicon, 3D metrology, Photomasks, Beam shaping, Semiconducting wafers, Standards development

Showing 5 of 52 publications
Conference Committee Involvement (2)
Photomask Technology
9 September 2003 | Monterey, California, United States
Photomask Technology
1 October 2002 | Monterey, CA, United States
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