Dr. Mathias Schubert
at Univ of Nebraska/Lincoln
SPIE Involvement:
Conference Program Committee | Author | Instructor
Publications (9)

PROCEEDINGS ARTICLE | February 15, 2008
Proc. SPIE. 6895, Zinc Oxide Materials and Devices III
KEYWORDS: Diffraction, Refractive index, Fabry–Perot interferometers, Waveguides, Luminescence, Laser damage threshold, Optical pumping, Zinc oxide, Temperature metrology, Diffraction gratings

PROCEEDINGS ARTICLE | February 20, 2007
Proc. SPIE. 6474, Zinc Oxide Materials and Devices II
KEYWORDS: Semiconductors, Gold, Oxides, Thin films, Polarization, Electrodes, Platinum, Zinc oxide, Heterojunctions, Dielectric polarization

PROCEEDINGS ARTICLE | March 7, 2006
Proc. SPIE. 6120, Terahertz and Gigahertz Electronics and Photonics V
KEYWORDS: Ellipsometry, Data modeling, Dielectrics, Gallium arsenide, Zinc, Magnetism, Terahertz radiation, Far infrared, Manganese, Selenium

PROCEEDINGS ARTICLE | July 9, 2003
Proc. SPIE. 5218, Complex Mediums IV: Beyond Linear Isotropic Dielectrics
KEYWORDS: Semiconductors, Surface plasmons, Reflection, Dielectrics, Interfaces, Wave propagation, Infrared radiation, Phonons, Polaritons, Plasma

PROCEEDINGS ARTICLE | November 11, 2002
Proc. SPIE. 4779, Advanced Characterization Techniques for Optical, Semiconductor, and Data Storage Components
KEYWORDS: Semiconductors, Ellipsometry, Data modeling, Dielectrics, Gallium arsenide, Magnetism, Picosecond phenomena, Molybdenum, Magnetic semiconductors, Dielectric polarization

PROCEEDINGS ARTICLE | June 24, 2002
Proc. SPIE. 4806, Complex Mediums III: Beyond Linear Isotropic Dielectrics
KEYWORDS: Thin films, Ellipsometry, Data modeling, Crystals, Dielectrics, Gallium nitride, Phonons, Picosecond phenomena, Gallium, Anisotropy

Showing 5 of 9 publications
Conference Committee Involvement (3)
Complex Mediums VI: Light and Complexity
31 July 2005 | San Diego, California, United States
Complex Mediums V: Light and Complexity
4 August 2004 | Denver, Colorado, United States
Complex Mediums IV: Beyond Linear Isotropic Dielectrics
4 August 2003 | San Diego, California, United States
Course Instructor
SC733: Ellipsometry: Determining Optical Properties at the Nano Scale
Ellipsometry, a measurement technique based on phase and amplitude changes of polarized light, is becoming popular in a widening array of applications because of increasing miniaturization of integrated circuits, breakthroughs in knowledge of biological macromolecules deriving from DNA and protein surface research, materials physics design of thin film multilayer surfaces, composite and smart materials, and materials engineering at the nano scale. Ellipsometry does not contact or damage samples, and is an ideal and precise measurement technique for determining optical and physical properties of materials at the nano scale. Contemporary applications cover widest spectral regions from the terahertz domain to ultra short wavelengths, addressing bound and unbound charge excitations in complex layer structures, unveiling critical foundation parameters of new materials, or controlling intricate layer structures in real time during growth, for example. Insight into state-of-the art ellipsometry characterization approaches, including data acquisition and analysis procedures, will be given by surveys of science and technology of ellipsometry for scientists and researchers at the forefront of nanotechnology, accompanied by a sound introductory sequence into the basics of this critical subject.
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