Matt Malloy
Metrology Program Manager
Publications (18)

SPIE Journal Paper | 23 August 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Signal to noise ratio, Electrons, Monte Carlo methods, Silicon, Image processing, Scanning electron microscopy, Sensors, Inspection, Defect inspection, Defect detection

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Reticles, Metrology, Scanners, Particles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Electromagnetic coupling, Prototyping, EUV optics

Proceedings Article | 9 November 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Metrology, Calibration, Image processing, Scanners, Image acquisition, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Electromagnetic coupling, Prototyping

Proceedings Article | 4 September 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Wafer-level optics, Imaging systems, Inspection, Optical inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Semiconducting wafers, Optics manufacturing, Defect inspection

Proceedings Article | 19 March 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Manufacturing, Inspection, Optical inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Semiconducting wafers, Optics manufacturing, Prototyping, Defect inspection

Showing 5 of 18 publications
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