Dr. Matthew Richter Profile

Dr. Matthew Richter

at Innovative Process Solutions

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 27 August 1998 Paper

Compact FTIR wafer-state sensors: a new way of in-line ULSI characterization

Victor Yakovlev, Sylvie Bosch-Charpenay, Matthew Richter, Peter Rosenthal, Peter Solomon, Jiazhan Xu

Proceedings Volume 3509, (1998) https://doi.org/10.1117/12.324422

KEYWORDS: FT-IR spectroscopy, Sensors, Process control, Semiconductors, Metrology, Spectroscopy, Spectrometers, Reflectance spectroscopy, Doping, Dielectrics

Read Abstract +

The perception of FTIR spectroscopy as an expensive, non- compact and vibration sensitive analytical technique, is rapidly changing with the recent introduction of small, robust and fast FTIR spectrometers dedicated to in-line and in-situ process control. FTIR Reflectance Spectroscopy has become a powerful in-line characterization technique delivering information on epi-thickness, doping concentration, dielectric film composition, molecular bond density, thickness of thick semiconductor films, deep trenches, etc., inaccessible in the visible range. The metrology capabilities of the technique will be outlined, including a discussion of process integration and semiconductor yield enchantment issues. The new instrument employs a vibrationally isolated FTIR interferometer and a high-speed digitizer. This combination allows a significantly faster scan rate, and a subsequently superior signal-to-noise ratio. The sensor is designed to be mounted on a process chamber equipped with normal or oblique ports, and provides normal or oblique incidence measuring modes. Outstanding vibration suppression, thermal stability, and high S/N makes it possible to achieve process control with monolayer thickness resolution. Particular examples on ULSI thin film/wafer-state FTIR metrology is presented.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years