Matthew Lamantia
BEOL Engg. Leader at Toppan Photomasks Inc
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 19 May 2011 Paper
Proceedings Volume 8081, 80810X (2011) https://doi.org/10.1117/12.899173
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Scanners, SRAF, Binary data, Lithography, Cadmium, Metrology, Scattering

Proceedings Article | 25 September 2010 Paper
Proceedings Volume 7823, 78230N (2010) https://doi.org/10.1117/12.864529
KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Reticles, Binary data, Scanning electron microscopy, Scanners, Lithography, Optical proximity correction, Metrology

Proceedings Article | 11 May 2009 Paper
Tatsuya Nagatomo, Vicky Philipsen, Shingo Wada, Mitsuharu Yamana, Yoji Tonooka, Matthew Lamantia
Proceedings Volume 7379, 73791L (2009) https://doi.org/10.1117/12.824298
KEYWORDS: Photomasks, Semiconducting wafers, Electroluminescence, SRAF, Critical dimension metrology, Lithography, Binary data, Quartz, Polarization, Manufacturing

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73790R (2009) https://doi.org/10.1117/12.824268
KEYWORDS: Reticles, Photomasks, Semiconducting wafers, Printing, Wafer inspection, Inspection, Extreme ultraviolet, Scanning electron microscopy, Atomic force microscopy, Distortion

Proceedings Article | 19 May 2008 Paper
Toshio Konishi, Yosuke Kojima, Matthew Lamantia, Takashi Haraguchi, Yoshimitsu Okuda, Yuichi Fukushima, Hiroyuki Takahashi, Masato Tanabe
Proceedings Volume 7028, 702803 (2008) https://doi.org/10.1117/12.796010
KEYWORDS: Photomasks, Chromium, Semiconducting wafers, Air contamination, Lithography, Nanoimprint lithography, Printing, Critical dimension metrology, Binary data, Dry etching

Showing 5 of 11 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top