Dr. Matthew G. Lassiter
Research Engineer at Photronics Inc
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 21 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Polarization, Etching, Manufacturing, Chromium, Photomasks, Plasma etching, Chlorine, Semiconducting wafers, Plasma

Proceedings Article | 15 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Polarization, Etching, Manufacturing, Chromium, Photomasks, Plasma etching, Chlorine, Semiconducting wafers, Plasma

Proceedings Article | 9 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Reticles, Silica, Scattering, Etching, Manufacturing, Chromium, Photomasks, Wet etching, Resolution enhancement technologies

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Semiconductors, Lithography, Image processing, Manufacturing, Image resolution, Photoresist materials, Image transmission, Photomasks, Nanoimprint lithography, 193nm lithography

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Etching, Quartz, Manufacturing, Inspection, Scanning electron microscopy, Software development, Photomasks, Binary data, Phase shifts

Showing 5 of 13 publications
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