Matthew Leuthold
at GLOBALFOUNDRIES Inc.
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 16 October 2019 Presentation + Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Photomasks, Data modeling, Optical proximity correction, Critical dimension metrology, Calibration, Lithography, Semiconducting wafers, Manufacturing, Opacity, Etching

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top