Dr. Matthew M. Meyer
at Dow Chemical Co
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Lithography, Polymers, Photons, Photoresist materials, Transmittance, Polymerization, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Absorption

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Polymers, Molecules, Electrons, Chromophores, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Polymer thin films, Absorption

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