Dr. Matthew M. Meyer
at Dow Inc
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 29 March 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Polymers, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist materials, Polymerization, Semiconducting wafers, Photons, Absorption, Lithography, Transmittance

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Polymers, Extreme ultraviolet, Absorption, Line width roughness, Extreme ultraviolet lithography, Polymer thin films, Chromophores, Electrons, Molecules, Photoresist materials

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top