Dr. Matthew J. Partlow
Principal Scientist at Energetiq Technology Inc
SPIE Involvement:
Author
Publications (8)

SPIE Journal Paper | 21 May 2012
JM3 Vol. 11 Issue 02
KEYWORDS: Extreme ultraviolet, Plasma, Light sources, Photomasks, Metrology, Inspection, Modulators, Xenon, Extreme ultraviolet lithography, Magnetism

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Light sources, Data modeling, Inspection, Physics, Xenon, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Light sources, Metrology, Copper, Inspection, Magnetism, Modulators, Xenon, Photomasks, Extreme ultraviolet, Plasma

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Light sources, Metrology, Switches, Modulators, Xenon, Diodes, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Chaos

Proceedings Article | 28 April 2010
Proc. SPIE. 7680, Next-Generation Spectroscopic Technologies III
KEYWORDS: Infrared imaging, Electrodes, Ultraviolet radiation, Lamps, Physics, Semiconductor lasers, Xenon, Vacuum ultraviolet, Laser optics, Plasma

Showing 5 of 8 publications
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