Dr. Matthew H. Seaberg Profile

Dr. Matthew H. Seaberg

at SLAC National Accelerator Lab

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Author

Publications (9)

Proceedings Article | 25 August 2020 Presentation

Characterization of the LCLS KB mirrors with stitching methods

May Ling Ng, Daniele Cocco, David Fritz, Lance Lee, Daniel Morton, Matthew Seaberg

Proc. SPIE. 11491, Advances in X-Ray/EUV Optics and Components XV

KEYWORDS: Cooling systems, Mirrors, Metrology, Mechanics, X-rays, Interferometry, Wavefronts, Space mirrors, Grazing incidence, Liquid crystal lasers

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Proceedings Article | 24 April 2019 Presentation + Paper

Nanofocus characterization at the Coherent X-ray Imaging instrument using 2D single grating interferometry

Matthew Seaberg, Andrew Aquila, Mengning Liang, Hae Ja Lee, Bob Nagler, Yanwei Liu, Anne Sakdinawat, Frank Seiboth, Mikako Makita, Yanwen Sun, Riccardo Signorato, Sergio Carbajo, Yiping Feng, Jacek Krzywinski, Diling Zhu, Sébastien Boutet

Proc. SPIE. 11038, X-Ray Free-Electron Lasers: Advances in Source Development and Instrumentation V

KEYWORDS: Optical microscopes, Monochromatic aberrations, Mirrors, Sensors, Calibration, X-rays, Interferometry, Scanning electron microscopy, X-ray imaging

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Proceedings Article | 24 April 2019 Presentation + Paper

Higher order modes at FELs: a machine interpretation

Peihao Sun, Yanwen Sun, Diling Zhu, Sanghoon Song, Haoyuan Li, Matthieu Chollet, Matthew Seaberg, Jerome Hastings, Aymeric Robert, Mark Sutton, Yiping Feng

Proc. SPIE. 11038, X-Ray Free-Electron Lasers: Advances in Source Development and Instrumentation V

KEYWORDS: X-rays, Electrons, Diagnostics, Dynamic light scattering, Neural networks, Spatial coherence, X-ray lasers, X-ray imaging, Free electron lasers, Stochastic processes

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Proceedings Article | 18 September 2018 Presentation + Paper

Inspecting adaptive optics with at-wavelength wavefront metrology

J. Krempaský, F. Koch, P. Vagovič, L. Mikeš, A. Jaggi, C. Svetina, U. Flechsig, L. Patthey, S. Marathe, D. Batey, S. Cipiccia, C. Rau, F. Seiboth, M. Seaberg, C. David, U. Wagner

Proc. SPIE. 10761, Adaptive X-Ray Optics V

KEYWORDS: Mirrors, Light sources, X-ray optics, Lenses, X-rays, Wavefront aberrations, Adaptive optics, Wavefront analysis, Wavefront distortions, Wavefront metrology

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Proceedings Article | 21 April 2016 Paper

Lensless hyperspectral spectromicroscopy with a tabletop extreme-ultraviolet source

Dennis Gardner, Bosheng Zhang, Matthew Seaberg, Elisabeth Shanblatt, Christina Porter, Robert Karl, Christopher Mancuso, Henry Kapteyn, Margaret Murnane, Daniel Adams

Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX

KEYWORDS: Diffraction, Coherence imaging, Microscopy, Photons, X-rays, Silicon, Reflectivity, Multiplexing, Phase imaging, Process control, Extreme ultraviolet, Coherent x-ray sources, Defect inspection

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Proceedings Article | 2 April 2014 Paper

Quantitative tabletop coherent diffraction imaging microscope for EUV lithography mask inspection

Bosheng Zhang, Daniel Adams, Matthew Seaberg, Dennis Gardner, Elisabeth Shanblatt, Henry Kapteyn, Margaret Murnane

Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII

KEYWORDS: Microscopes, Coherence imaging, Mirrors, X-rays, Inspection, Image resolution, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

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Proceedings Article | 26 September 2013 Paper

Tabletop coherent diffractive imaging of extended objects in transmission and reflection geometry

Matthew Seaberg, Bosheng Zhang, Daniel Adams, Dennis Gardner, Henry Kapteyn, Margaret Murnane

Proc. SPIE. 8851, X-Ray Nanoimaging: Instruments and Methods

KEYWORDS: Microscopes, Diffraction, Coherence imaging, Mirrors, Sensors, Light scattering, Image restoration, Image resolution, Phase retrieval, Extreme ultraviolet

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Proceedings Article | 18 April 2013 Paper

Coherent diffractive imaging microscope with a tabletop high harmonic EUV source

Bosheng Zhang, Matthew Seaberg, Daniel Adams, Dennis Gardner, Margaret Murnane, Henry Kapteyn

Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII

KEYWORDS: Microscopes, Diffraction, Coherence imaging, Mirrors, Imaging systems, Image resolution, Photomasks, Extreme ultraviolet, Charge-coupled devices, Zone plates

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Proceedings Article | 3 April 2012 Paper

Ultrahigh 22-nm resolution EUV coherent diffraction imaging using a tabletop 13-nm high harmonic source

Matthew Seaberg, Daniel Adams, Bosheng Zhang, Dennis Gardner, Margaret Murnane, Henry Kapteyn

Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI

KEYWORDS: Microscopes, Diffraction, Coherence imaging, Imaging systems, Image processing, Light scattering, Image resolution, Phase retrieval, Extreme ultraviolet, Spatial resolution

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Showing 5 of 9 publications

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