Mr. Matthew J. Sendelbach
Research Scientist at Nova Measuring Instruments
SPIE Involvement:
Conference Program Committee | Author
Publications (45)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Logic, Etching, Gallium arsenide, Silicon, Heart, Transmission electron microscopy, Scatterometry, Fin field effect transitor, Nanowires

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Calibration, Scatterometry, Machine learning, Field effect transistors, Epitaxy, High volume manufacturing, Semiconducting wafers, Scatter measurement, Model-based design

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconductors, Metrology, Etching, Gallium arsenide, Silicon, Measurement devices, Geometrical optics, X-ray fluorescence spectroscopy, Nanolithography, Fin field effect transitor

PROCEEDINGS ARTICLE | April 12, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Metrology, Metals, X-rays, Copper, Resistance, Scatterometry, Process control, Machine learning, Semiconducting wafers, Back end of line

PROCEEDINGS ARTICLE | March 31, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Diffractive optical elements, Etching, Germanium, X-ray diffraction, Gallium arsenide, Silicon, Materials processing, Solids, Semiconducting wafers, X-ray fluorescence spectroscopy

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Metrology, Etching, Copper, Dielectrics, 3D modeling, Scatterometry, 3D metrology, Process control, Photomasks, Semiconducting wafers, Back end of line

Showing 5 of 45 publications
Conference Committee Involvement (7)
Metrology, Inspection, and Process Control for Microlithography XXXII
26 February 2018 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXI
27 February 2017 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXX
22 February 2016 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXIX
23 February 2015 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXVIII
24 February 2014 | San Jose, California, United States
Showing 5 of 7 published special sections
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