Matthew J. Sendelbach
Research Scientist
SPIE Involvement:
Conference Program Committee | Author
Publications (49)

Proceedings Article | 2 July 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Copper, Scatterometry, Machine learning

Proceedings Article | 25 June 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Metrology, Optical lithography, Inspection, Capacitance, Process control, Machine learning

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Oxides, Diffractive optical elements, Etching, Resistance, Scatterometry, Capacitance, Process control, Machine learning, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 19 September 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Wafer-level optics, Lithography, Metrology, Scatterometry, Machine learning, Maskless lithography, Reflectance spectroscopy, Electron beam direct write lithography, Semiconducting wafers, Inverse optics, Channel projecting optics

Proceedings Article | 5 September 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Mathematical modeling, Metrology, Data modeling, Scanning electron microscopy, Transmission electron microscopy, Scatterometry, Machine learning, Field effect transistors, Semiconducting wafers, Scatter measurement

Showing 5 of 49 publications
Conference Committee Involvement (9)
Metrology, Inspection, and Process Control for Microlithography XXXIV
24 February 2020 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXIII
25 February 2019 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXII
26 February 2018 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXI
27 February 2017 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXX
22 February 2016 | San Jose, California, United States
Showing 5 of 9 Conference Committees
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