Dr. Matthias Roesch
Systems Engineer Imaging at Carl Zeiss SMT GmbH
SPIE Involvement:
Publications (11)

Proceedings Article | 10 April 2024 Poster + Paper
Matthias Roesch, Grizelda Kersteen, Andreas Verch, Maximilian Albert, Philip Heringlake, Klaus Gwosch, Renzo Capelli
Proceedings Volume 12953, 129531F (2024) https://doi.org/10.1117/12.3010001
KEYWORDS: 3D mask effects, Light sources and illumination, Extreme ultraviolet, Simulations, 3D image processing, Extreme ultraviolet lithography, Reticles, Metrology, Image analysis, Diffraction

Proceedings Article | 22 November 2023 Presentation
Klaus Gwosch, Renzo Capelli, Matthias Roesch, Robert Nicholls, Bruno Langbehn, Michael Mohn, Andreas Verch, Maximilian Albert, Grizelda Kersteen, Alexander Winkler, Carolin Müller, Sven Krannich
Proceedings Volume PC12750, PC127500O (2023) https://doi.org/10.1117/12.2687495
KEYWORDS: Extreme ultraviolet lithography, Scanners, Extreme ultraviolet, Imaging systems, Semiconducting wafers, Printing, Photomasks, Metrology, Lithography, Light sources and illumination

Proceedings Article | 5 October 2023 Paper
Matthias Roesch, Renzo Capelli, Lukas Fischer, Klaus Gwosch, Grizelda Kersteen, Carolin Mueller, Robert Nicholls, Andreas Verch, Alexander Winkler
Proceedings Volume 12802, 128020L (2023) https://doi.org/10.1117/12.2681647
KEYWORDS: Metrology, Extreme ultraviolet lithography, Semiconducting wafers, Photomasks, Reticles, Lithography, EUV optics

Proceedings Article | 1 December 2022 Presentation + Paper
Renzo Capelli, Klaus Gwosch, Grizelda Kersteen, Matthias Roesch, Carolin Müller, Alexander Winkler, Andreas Verch
Proceedings Volume 12292, 122920N (2022) https://doi.org/10.1117/12.2641531
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Photomasks, Metrology, Image processing, Imaging systems, Image acquisition, Digital image processing, Defect inspection

Proceedings Article | 26 May 2022 Presentation + Paper
Renzo Capelli, Grizelda Kersteen, Sven Krannich, Markus Koch, Lukas Fischer, Matthias Roesch, Klaus Gwosch
Proceedings Volume 12051, 120510A (2022) https://doi.org/10.1117/12.2612261
KEYWORDS: Photomasks, Extreme ultraviolet, Scanners, Extreme ultraviolet lithography, Semiconducting wafers, Imaging systems, Metrology, Optics manufacturing, EUV optics, Source mask optimization

Showing 5 of 11 publications
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