Mr. Matthias Rudolph Profile

Matthias Rudolph

at Fraunhofer IPMS-CNT

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 21 March 2016 Paper

Evaluation of water based intelligent fluids for resist stripping in single wafer cleaning tools

Matthias Rudolph, Silvio Esche, Christoph Hohle, Dirk Schumann, Justus von Sonntag, Philipp Steinke, Xaver Thrun

Proceedings Volume 9779, 977919 (2016) https://doi.org/10.1117/12.2220156

KEYWORDS: Advanced cleaning techniques, Mask cleaning, Fluid dynamics, Microfluidics, Semiconducting wafers, Water, Silicon, Photoresist processing, Chemistry, Particles, Scanning electron microscopy, Plasma etching, Photoresist materials, Polymers, Plasma

Read Abstract +

Proceedings Article | 8 March 2016 Paper

Patterning and imaging with electrons: assessing multi-beam SEM for e-beam structured CMOS samples

Friedhelm Panteleit, Gregor Dellemann, Manuela Gutsch, Christoph Hohle, Matthias Rudolph, Katja Steidel, Xaver Thrun, Dirk Zeidler, Tomasz Garbowski, Elke Reich

Proceedings Volume 9778, 97781V (2016) https://doi.org/10.1117/12.2225501

KEYWORDS: Electrons, Defect inspection, Semiconducting wafers, Scanning electron microscopy, Inspection, Wafer inspection, Semiconductors, Electron beams, Metals, Tin, Electron beam lithography, Image processing, Sensors

Read Abstract +

Proceedings Article | 17 October 2014 Paper

Innovative and water based stripping approach for thick and bulk photoresists

Silvio Esche, Matthias Rudolph, Dirk Schumann, Xaver Thrun, Christoph Hohle

Proceedings Volume 9231, 92310U (2014) https://doi.org/10.1117/12.2069941

KEYWORDS: Photoresist materials, Silicon, Microfluidics, Chemistry, Metals, Water, Semiconductors, Photoresist processing, Fluid dynamics, Plasma

Read Abstract +

Proceedings Article | 27 March 2014 Paper

Introduction of an innovative water based photoresist stripping process using intelligent fluids

Matthias Rudolph, Christoph Hohle, Dirk Schumann, Xaver Thrun, Anita Hoehne, Silvio Esche

Proceedings Volume 9051, 90510T (2014) https://doi.org/10.1117/12.2048068

KEYWORDS: Silicon, Semiconducting wafers, Semiconductors, Photoresist processing, Chemistry, Water, Photoresist materials, Contamination, Particles, Microelectromechanical systems

Read Abstract +

Proceedings Article | 29 March 2013 Paper

Evaluation of an advanced dual hard mask stack for high resolution pattern transfer

J. Paul, M. Rudolph, S. Riedel, X. Thrun, C. Hohle, S. Wege

Proceedings Volume 8685, 86850V (2013) https://doi.org/10.1117/12.2018247

KEYWORDS: Zirconium dioxide, Etching, Silicon, Photomasks, Silica, Optical lithography, Atomic layer deposition, Surface roughness, Crystals, Plasma

Read Abstract +

Proceedings Article | 21 March 2012 Paper

Feasibility study of optical/e-beam complementary lithography

Jan Paul, Xaver Thrun, Philipp Jaschinsky, Frank Kahlenberg, Christof Klein, Jan Klikovits, Martin Freitag, Christoph Hohle, Kang-Hoon Choi, Matthias Rudolph, Manuela Gutsch

Proceedings Volume 8323, 83232C (2012) https://doi.org/10.1117/12.916386

KEYWORDS: Etching, Lithography, Electron beam lithography, Silicon, Semiconducting wafers, Photomasks, 193nm lithography, Electron beam direct write lithography, Beam shaping, Optics manufacturing

Read Abstract +

Showing 5 of 6 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years