Matthias Rudolph
at Fraunhofer IPMS-CNT
SPIE Involvement:
Publications (6)

Proceedings Article | 21 March 2016 Paper
Matthias Rudolph, Silvio Esche, Christoph Hohle, Dirk Schumann, Philipp Steinke, Xaver Thrun, Justus von Sonntag
Proceedings Volume 9779, 977919 (2016)
KEYWORDS: Advanced cleaning techniques, Mask cleaning, Fluid dynamics, Microfluidics, Semiconducting wafers, Water, Silicon, Photoresist processing, Chemistry, Particles, Scanning electron microscopy, Plasma etching, Photoresist materials, Polymers, Plasma

Proceedings Article | 8 March 2016 Paper
Tomasz Garbowski, Friedhelm Panteleit, Gregor Dellemann, Manuela Gutsch, Christoph Hohle, Elke Reich, Matthias Rudolph, Katja Steidel, Xaver Thrun, Dirk Zeidler
Proceedings Volume 9778, 97781V (2016)
KEYWORDS: Electrons, Defect inspection, Semiconducting wafers, Scanning electron microscopy, Inspection, Wafer inspection, Semiconductors, Electron beams, Metals, Tin, Electron beam lithography, Image processing, Sensors

Proceedings Article | 17 October 2014 Paper
Proceedings Volume 9231, 92310U (2014)
KEYWORDS: Photoresist materials, Silicon, Microfluidics, Chemistry, Metals, Water, Semiconductors, Photoresist processing, Fluid dynamics, Plasma

Proceedings Article | 27 March 2014 Paper
Matthias Rudolph, Xaver Thrun, Dirk Schumann, Anita Hoehne, Silvio Esche, Christoph Hohle
Proceedings Volume 9051, 90510T (2014)
KEYWORDS: Silicon, Semiconducting wafers, Semiconductors, Photoresist processing, Chemistry, Water, Photoresist materials, Contamination, Particles, Microelectromechanical systems

Proceedings Article | 29 March 2013 Paper
J. Paul, M. Rudolph, S. Riedel, X. Thrun, S. Wege, C. Hohle
Proceedings Volume 8685, 86850V (2013)
KEYWORDS: Zirconium dioxide, Etching, Silicon, Photomasks, Silica, Optical lithography, Atomic layer deposition, Surface roughness, Crystals, Plasma

Showing 5 of 6 publications
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