Dr. Matthias Wurm
at Physikalisch Technische Bundesanstalt
SPIE Involvement:
Author
Publications (24)

SPIE Journal Paper | 5 May 2020
JM3 Vol. 19 Issue 02
KEYWORDS: Photomasks, Scatterometry, Lithography, Chaos, Inverse problems, Stochastic processes, Bayesian inference, Silicon, Error analysis, Oxides

Proceedings Article | 22 July 2019
Proc. SPIE. 11057, Modeling Aspects in Optical Metrology VII
KEYWORDS: Statistical analysis, Ellipsometry, Computer simulations, Spectroscopic ellipsometry, Optical testing, Inverse optics, Inverse problems, Polarization, Maxwell's equations, Error analysis

Proceedings Article | 21 June 2019
Proc. SPIE. 11057, Modeling Aspects in Optical Metrology VII
KEYWORDS: Scatterometry, Polarization, Chaos, Silicon, Inverse problems, Systems modeling, Oxides, Photomasks, Scatter measurement, Data modeling

Proceedings Article | 21 June 2019
Proc. SPIE. 11057, Modeling Aspects in Optical Metrology VII
KEYWORDS: Plasmonics, Ellipsometry, Scanning electron microscopy, Numerical simulations, Metrology, Nanostructures, Near field optics

Proceedings Article | 16 September 2016
Proc. SPIE. 9922, Optical Trapping and Optical Micromanipulation XIII
KEYWORDS: Metals, Sensors, Photodiodes, Magnetism, Electrodes, Silicon, Interferometers, Semiconductor lasers, Polarization, Thermal effects

Showing 5 of 24 publications
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