Dr. Maurits van der Schaar
at ASML
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 20 October 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Diffraction, Metrology, Etching, Scanners, Process control, Semiconducting wafers, Overlay metrology, Back end of line, Front end of line

Proceedings Article | 13 May 2013
Proc. SPIE. 8788, Optical Measurement Systems for Industrial Inspection VIII
KEYWORDS: Wafer-level optics, Semiconductors, Diffraction, Metrology, Sensors, Geometrical optics, Semiconducting wafers, Environmental sensing, Overlay metrology, Diffraction gratings

Proceedings Article | 10 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Diffraction, Metrology, Scanners, Time metrology, High volume manufacturing, Thin film coatings, Semiconducting wafers, Overlay metrology, Tin, Chemical mechanical planarization

Proceedings Article | 3 April 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Lithography, Diffraction, Reticles, Metrology, Physics, Scatterometry, Semiconducting wafers, Overlay metrology, Standards development, Diffraction gratings

Proceedings Article | 20 April 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Lithography, Diffraction, Metrology, Optical lithography, Scanning electron microscopy, Double patterning technology, Semiconducting wafers, Overlay metrology, Resolution enhancement technologies, Diffraction gratings

Showing 5 of 17 publications
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