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Dr. Max O. Bloomfield
at Rensselaer Polytechnic Institute
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Publications (4)
SPIE Journal Paper | 8 November 2022 Open Access
Bayesian dropout approximation in deep learning neural networks: analysis of self-aligned quadruple patterning
JM3, Vol. 21, Issue 04, 041604, (November 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.041604
KEYWORDS: Reactive ion etching, Neural networks, Surface plasmons, Semiconducting wafers, Optical lithography, Data modeling, Stochastic processes, Etching, Data processing, Chaos
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Proceedings Article | 6 May 2020 Presentation + Paper
Bayesian dropout approximation in deep learning neural networks: analysis of self-aligned quadruple patterning
Proceedings Volume 11329, 113290B (2020) https://doi.org/10.1117/12.2551649
KEYWORDS: Neural networks, Surface plasmons, Reactive ion etching, Optical lithography, Semiconducting wafers, Data modeling, Metrology, Bayesian inference, Stochastic processes, Etching
Proceedings Article | 18 March 2016 Paper
Thermomechanical behavior of EUV pellicle under dynamic exposure conditions
Proceedings Volume 9776, 977621 (2016) https://doi.org/10.1117/12.2218453
KEYWORDS: Extreme ultraviolet lithography, Pellicles, Extreme ultraviolet, Silicon, EUV optics, Infrared radiation, Metals
Proceedings Article | 29 April 2003 Open Access Paper
Development of microstructure in nanostructures and thin films
Max Bloomfield, Yeon Ho Im, Jian Wang, Hanchen Huang, Timothy Cale
Proceedings Volume 5118, (2003) https://doi.org/10.1117/12.499465
KEYWORDS: Process modeling, Monte Carlo methods, Interfaces, Physical vapor deposition, Systems modeling, 3D modeling, Particles, Deposition processes, Thin films, Numerical analysis
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