Mr. Max O. Bloomfield
at Rensselaer Polytechnic Institute
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Metals, Silicon, Pellicles, Infrared radiation, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

PROCEEDINGS ARTICLE | April 29, 2003
Proc. SPIE. 5118, Nanotechnology
KEYWORDS: Thin films, Particles, Interfaces, 3D modeling, Numerical analysis, Monte Carlo methods, Physical vapor deposition, Deposition processes, Systems modeling, Process modeling

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