Mr. Max Lau Profile

Max Lau

General Manager Technical

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Publications (2)

Proceedings Article | 14 May 2007 Paper

SEM-based system for photomask placement metrology

Max Lau, Yulia Korobko

Proceedings Volume 6607, 660727 (2007) https://doi.org/10.1117/12.728990

KEYWORDS: Optical proximity correction, Metrology, Scanning electron microscopy, Image registration, Photomasks, Reticles, Image processing, Overlay metrology, Critical dimension metrology, Distortion

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Proceedings Article | 5 April 2007 Paper

Study of rigorous effects and polarization on phase shifting masks through simulations and in-die phase measurements

Kyung Lee, Malahat Tavassoli, Max Lau, Kiho Baik, Barry Lieberman, Sascha Perlitz, Ute Buttgereit, Thomas Scherübl

Proceedings Volume 6518, 65181Y (2007) https://doi.org/10.1117/12.712908

KEYWORDS: Photomasks, Phase measurement, Scanners, Etching, Semiconducting wafers, Polarization, Phase shifts, Metrology, Near field, Imaging systems

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