Dr. Maxence P. Delorme
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII

Proceedings Article | 22 February 2021 Poster + Presentation + Paper
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Scanners, Scanning electron microscopy, Process control, Finite element methods, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Process modeling, OLE for process control

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Metrology, Defect detection, Data modeling, Calibration, Pattern recognition, Inspection, Wafer inspection, Semiconducting wafers, Failure analysis, Stochastic processes

Proceedings Article | 13 October 2020 Poster + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Metrology, Data modeling, Calibration, Finite element methods, Photomasks, Extreme ultraviolet, Optical proximity correction, Semiconducting wafers, Process modeling

Proceedings Article | 27 March 2017 Presentation + Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Oxides, Metrology, Data modeling, Calibration, Etching, Metals, Resistance, Photoresist materials, Finite element methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers, Back end of line

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