Maxence P. Delorme
SPIE Involvement:
Publications (11)

Proceedings Article | 10 April 2024 Presentation + Paper
Jyun-Ming Chen, David Rio, Maxence Delorme, Cyrus Tabery, Christoph Hennerkes, Chris Spence, Benjamin Kam, Mohand Brouri, Nader Shamma
Proceedings Volume 12953, 129530C (2024)
KEYWORDS: Photoresist materials, Optical proximity correction, Calibration, Semiconducting wafers, Shrinkage, Printing, Scanning electron microscopy, Photoresist developing, Metals, Critical dimension metrology

SPIE Journal Paper | 25 November 2022
JM3, Vol. 21, Issue 04, 043202, (November 2022)
KEYWORDS: Photomasks, Design and modelling, Optical lithography, Metals, Binary data, SRAF, Critical dimension metrology, Extreme ultraviolet, Printing, Logic

Proceedings Article | 16 September 2022 Paper
Maxence Delorme, Werner Gillijns, Christoph Hennerkes, Emily Gallagher, Adam Lyons, Mahmoud Mohsen, Tom Wallow
Proceedings Volume 12325, 123250L (2022)
KEYWORDS: Photomasks, Optical proximity correction, Metrology, Scanning electron microscopy, Logic, Distortion, Extreme ultraviolet, Critical dimension metrology

Proceedings Article | 26 May 2022 Paper
Proceedings Volume 12051, 120510I (2022)
KEYWORDS: SRAF, Logic, Semiconducting wafers, Lithography, Photomasks, Optical proximity correction, Critical dimension metrology, Printing, Extreme ultraviolet lithography, Statistical analysis

Proceedings Article | 5 March 2022 Presentation + Paper
Youssef Drissi, Werner Gillijns, Sebastien Lardenois, Peter Verheyen, Guy Lepage, Mahmoud Mohsen, Maxence Delorme
Proceedings Volume 12012, 1201208 (2022)
KEYWORDS: Optical proximity correction, Scanning electron microscopy, Semiconducting wafers, Silicon photonics, Photomasks, Metrology, Manufacturing, Silicon, Etching, Resolution enhancement technologies

Showing 5 of 11 publications
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