Dr. Maxime Besacier
Assistant Professor at CEA-LETI MINATEC
SPIE Involvement:
Author
Publications (27)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Diffraction, Metrology, Fourier transforms, Scanning electron microscopy, Line width roughness, Critical dimension metrology, Line edge roughness

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Electron beams, Calibration, Image processing, Silicon, 3D modeling, Image analysis, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Semiconducting wafers

Proceedings Article | 19 September 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Metrology, Manufacturing, Computer programming, Scanning electron microscopy, Line width roughness, Critical dimension metrology, Line edge roughness, Statistical modeling, Edge roughness

SPIE Journal Paper | 31 July 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Metrology, Line width roughness, Critical dimension metrology, Sensors, X-rays, Scanning electron microscopy, Reflectivity, Scattering, Reliability, Manufacturing

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, CMOS sensors, Metrology, Image processing, Quantum efficiency, Photodiodes, Scanning electron microscopy, Microlens, Neural networks

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, X-rays, Manufacturing, Reliability, Reflectivity, Scanning electron microscopy, Microelectronics, Line width roughness, Critical dimension metrology

Showing 5 of 27 publications
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