Dr. Maxime Darnon
Associate Professor & Researcher at CNRS-LN2
SPIE Involvement:
Conference Program Committee | Author
Publications (4)

PROCEEDINGS ARTICLE | March 17, 2015
Proc. SPIE. 9428, Advanced Etch Technology for Nanopatterning IV
KEYWORDS: Etching, Silicon, Oxygen, Line width roughness, Plasma etching, Critical dimension metrology, Line edge roughness, Neodymium, Photoresist processing, Plasma

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8685, Advanced Etch Technology for Nanopatterning II
KEYWORDS: Etching, Ions, Silicon, Mass spectrometry, Oxygen, Plasma etching, Semiconducting wafers, Information operations, Plasma

PROCEEDINGS ARTICLE | March 17, 2012
Proc. SPIE. 8328, Advanced Etch Technology for Nanopatterning
KEYWORDS: Optical lithography, Silica, Etching, Silicon, Oxygen, Scanning electron microscopy, Photomasks, Plasma etching, Picosecond phenomena, Plasma

PROCEEDINGS ARTICLE | March 17, 2012
Proc. SPIE. 8328, Advanced Etch Technology for Nanopatterning
KEYWORDS: Oxides, Silica, Etching, Ions, Silicon, Plasma etching, Semiconducting wafers, Plasma, Oxidation

Conference Committee Involvement (7)
Advanced Etch Technology for Nanopatterning VII
26 February 2018 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning VI
27 February 2017 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning V
22 February 2016 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning IV
23 February 2015 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning III
24 February 2014 | San Jose, California, United States
Showing 5 of 7 published special sections
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