Maxime Gatefait
at STMicroelectronics
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 20 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Lithography, Contamination, Etching, Scanners, Semiconducting wafers, Overlay metrology, Plasma

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Reticles, Metrology, Data modeling, Sensors, Scanners, Semiconducting wafers, Performance modeling, Data corrections, Overlay metrology, Process modeling, Lithographic process control

Proceedings Article | 13 March 2018 Presentation + Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Reticles, Optical lithography, Data modeling, Scanners, Reliability, Process control, Optical alignment, Overlay metrology

Proceedings Article | 24 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Diffraction, Metrology, Visualization, Sensors, Image processing, Scanners, Silicon, Inspection, Electroluminescence, Process control, Forward error correction, Field emission displays, Overlay metrology

Proceedings Article | 23 October 2015 Paper
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Reticles, Metrology, Data modeling, Scanners, Image registration, Pellicles, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology

Showing 5 of 18 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top