Maxime Gatefait
at STMicroelectronics
SPIE Involvement:
Author
Publications (16)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Reticles, Optical lithography, Data modeling, Scanners, Reliability, Process control, Optical alignment, Overlay metrology

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Diffraction, Metrology, Visualization, Sensors, Image processing, Scanners, Silicon, Inspection, Electroluminescence, Process control, Forward error correction, Field emission displays, Overlay metrology

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Reticles, Metrology, Data modeling, Scanners, Image registration, Pellicles, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | September 4, 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Wafer-level optics, Metrology, Logic, Optical properties, Sensors, Metals, Scanners, Data processing, Photomasks, Semiconducting wafers

SPIE Journal Paper | April 10, 2015
JM3 Vol. 14 Issue 02
KEYWORDS: Semiconducting wafers, Optical lithography, Critical dimension metrology, Process control, Photomasks, Etching, Logic, Metrology, Lithography, Optical proximity correction

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Data mining, Reticles, Metrology, Data modeling, Databases, Scanners, Pattern recognition, Optical alignment, Semiconducting wafers, Overlay metrology

Showing 5 of 16 publications
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