Mayuka Osaki
at Hitachi Ltd
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: 3D acquisition, Scattering, Calibration, Nondestructive evaluation, Scanning electron microscopy, Monte Carlo methods, 3D metrology

SPIE Journal Paper | 1 January 2011
JM3 Vol. 10 Issue 1
KEYWORDS: Critical dimension metrology, Atomic force microscopy, Scanning electron microscopy, Critical dimension scanning electron microscopy, Monte Carlo methods, Model-based design, Silicon, Statistical analysis, Cadmium, Image processing

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Mathematical modeling, Lithography, Lithographic illumination, Scanning electron microscopy, Photoresist materials, Process control, Immersion lithography, Critical dimension metrology, Semiconducting wafers, Model-based design

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Statistical analysis, Cadmium, Scattering, Image processing, Silicon, Atomic force microscopy, Scanning electron microscopy, Monte Carlo methods, Critical dimension metrology, Model-based design

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Mathematical modeling, Silica, Scattering, Silicon, Atomic force microscopy, Scanning electron microscopy, Monte Carlo methods, Beam shaping, Critical dimension metrology, Model-based design

Showing 5 of 9 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top