Mazen Saied
PhD Student at STMicroelectronics
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Optical imaging, Optical lithography, Databases, Computer simulations, Photomasks, Optical simulations, Optical proximity correction, Critical dimension metrology, Process modeling, Current controlled current source

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Reticles, Logic, Scanning electron microscopy, Bridges, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design, Process modeling

Proceedings Article | 12 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Eye, Logic, Switching, Manufacturing, Printing, Photomasks, Immersion lithography, Optical proximity correction, SRAF

Proceedings Article | 16 November 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Diffraction, Lithographic illumination, Scattering, 3D modeling, Near field, Photomasks, Optical proximity correction, Semiconducting wafers, Systems modeling, Near field optics

Proceedings Article | 14 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Lithography, Optical lithography, Silicon, Inspection, Printing, Photomasks, Optical simulations, Optical proximity correction, SRAF, Semiconducting wafers

Showing 5 of 10 publications
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