We will describe recent work in the area of integrated nanophotonics that have applications to on chip communication.
In this context we will present passive filters and resonators produced through periodic waveguide modulation. We will
also demonstrate nonlinear optical pulse compression in a monolithic device that integrates self phase modulation and
dispersion compensation. We also discuss wavemixing applications.
Advances in nanoscale fabrication techniques in dielectric and metallic material systems has opened up new
opportunities in photonics and plasmonics for solving long standing problems in information systems and
telecommunication systems. In this talk, we discuss some of the metamaterials and devices that recently have been
demonstrated in our lab. These include metamaterials with space variant polarizability to realize on-chip, frequencyselective
resonators and Bragg gratings, as well as metal-semiconductor-dielectric nanolasers.
An add/drop filter based on coupled vertical gratings is presented on silicon. We analyze the device theoretically and
experimentally and show that the concept is easily extended to multi-channel add/drop filters. We demonstrate tunability
of the device bandwidth and operation wavelength. The free spectral range of the device exceeds the bandwidth used in
wavelength division multiplexing systems, which makes it ideally suited for use in such systems.
Different techniques for fabricating long-range plasmonic metallo-dielectric waveguides are discussed. The approaches
depend strongly on the material system in use. Specific results are presented for SU8 and PDMS.
Optical technology plays an increasingly important role in numerous applications areas, including communications, information processing, and data storage. However, as optical technology develops, it is evident that there is a growing need to develop reliable photonic integration technologies. This will include the development of passive as well as active optical components that can be integrated into functional optical circuits and systems, including filters, switching fabrics that can be controlled either electrically or optically, optical sources, detectors, amplifiers, etc. We explore the unique capabilities and advantages of nanotechnology in developing next generation integrated photonic chips. Our long-range goal is to develop a range of photonic nanostructures including artificially birefringent and resonant devices, photonic crystals, and photonic crystals with defects to tailor spectral filters, and nanostructures for spatial field localization to enhance optical nonlinearities, to facilitate on-chip system integration through compatible materials and fabrication processes. The design of artificial nanostructured materials, PCs and integrated photonic systems is one of the most challenging tasks as it not only involves the accurate solution of electromagnetic optics equations, but also the need to incorporate the material and quantum physics equations. Near-field interactions in artificial nanostructured materials provide a variety of functionalities useful for optical systems integration. Recently, the inclusion of surface plasmon photonics in this area has opened up a host of new possibilities Finally and most importantly, nanophotonics may enable easier integration with other nanotechnologies: electronics, magnetics, mechanics, chemistry, and biology. We will address some of these areas in this paper.
In this manuscript we describe the manipulation of surface plasmon polariton (SPP) modes excited in a two
dimensional periodic nanohole array scattering structure by tuning the fluid over the metal surface. We describe the
fabrication processes for making large area periodic nanohole arrays, and a soft lithography process for the addition of
microfluidic channels. We then show the tuning of various modes and the application for such structures as
multichannel, imaging SPP sensors.
We describe an approach to use the thin layer of SU-8 submicron pattern produced by holographic lithography as dry etching mask in chemically assisted ion beam etching (CAIBE) system. The effect of chlorine gas flow on etched sidewall was investigated; by matching the lateral etch and deposition rate, etching selectivity of about 7:1 has been achieved with vertical and smooth sidewall and damage-free upper portion of the etched structure. As an application, a half wavelength retardation plate for 1.55 mm wavelength was designed, fabricated and characterized.
We discuss various practical points in the design, fabrication and characterization of form birefringent retardation plates in GaAs. The role of the substrate in the device performance is presented, together with the importance of using anti-reflection coatings. Also, we discuss the specific case of metallic reflection gratings in GaAs substrates and the resulting enhanced retardation. Finally we present the results of thermal tuning of a nominally half-wave subwavelength retardation plate.