Medhat A. Toukhy
Staff Scientist at EMD Performance Materials Corp
SPIE Involvement:
Author
Publications (39)

PROCEEDINGS ARTICLE | March 20, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Polymers, Image processing, Dielectrics, Coating, Photoresist materials, Semiconductor manufacturing, Critical dimension metrology, Semiconducting wafers, Photoresist developing

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Contamination, Deep ultraviolet, Polymers, Diffusion, Chemistry, Inspection, Critical dimension metrology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 30, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lenses, Etching, Silicon, Coating, Manufacturing, Fourier transforms, Microlens, Contact lenses, Spherical lenses, Photoresist processing

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Gold, Polymers, Copper, Silicon, Coating, Chemistry, Fourier transforms, Plating, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Copper, Silicon, Chemistry, Oxygen, Plating, Thin film coatings, Photoresist processing, Semiconducting wafers, Electroplating

PROCEEDINGS ARTICLE | April 2, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Polymers, Resistance, Fourier transforms, Fluorine, Photoresist processing, Semiconducting wafers, Arsenic, Prototyping, Bottom antireflective coatings

Showing 5 of 39 publications
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