Meg W. Hung
at Synopsys Inc
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Data modeling, Transistors, Optical proximity correction, Tolerancing, Integrated circuit design, Optics manufacturing, Performance modeling, Model-based design, Process modeling

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