Dr. Mehdi Daneshpanah
Sr. Director of Engineering at KLA Corp
SPIE Involvement:
Area of Expertise:
Three dimensional sensing , Digital Holography , Medical imaging , Biophotonics , Display and visualization , Optical Metrology
Profile Summary

♦ Driven R&D and product development programs in semiconductor inspection and high-tech manufacturing industries with focus on systems architecture, algorithms and software.
♦ Extensive work in the area of new algorithm development and optimization for computational-optical systems. Hands on experience with 3D and high precision optical imaging / metrology systems.
♦ Experienced in system level design for highly complex computational-optical inspection tools for N10 and below.
♦ 50+ publications w/ h-index 14

Specialties: imaging system architecuture, algorithm design, mathematical and statistical modeling, optimization, advanced optical imaging, computational lithography, 3D optical imaging/display systems, digital holography, computational optics for 3D sensing, nonlinear microscopy, statistical data analysis and pattern recognition
Publications (18)

Proceedings Article | 16 October 2017 Paper
James Cheng, William Chou, C. Twu, Hsin-Fu Chou, Jackie Cheng, Colbert Lu, Heng-Jen Lee, Bosheng Zhang, Mehdi Daneshpanah, Apo Sezginer, David Wu, Mike Yeh, Albert Chien
Proceedings Volume 10451, 104510X (2017) https://doi.org/10.1117/12.2281215
KEYWORDS: Photomasks, Inspection, Scanning electron microscopy, Lithography, 3D modeling, Near field, Photoresist materials, Semiconducting wafers

Proceedings Article | 23 October 2015 Paper
K. D. Roeth, W. Choi, Y. Lee, S. Kim, D. Yim, F. Laske, M. Ferber, M. Daneshpanah, E. Kwon
Proceedings Volume 9635, 963506 (2015) https://doi.org/10.1117/12.2202818
KEYWORDS: Photomasks, Overlay metrology, Reticles, Semiconducting wafers, Metrology, Image registration, Manufacturing, Ions, Scanners, Error analysis

Proceedings Article | 9 July 2015 Paper
Proceedings Volume 9658, 965805 (2015) https://doi.org/10.1117/12.2196388
KEYWORDS: Photomasks, Metrology, Image registration, Nanofabrication, Calibration, Reticles, Beam shaping, Manufacturing, Lithography, Model-based design

Proceedings Article | 28 July 2014 Paper
M. Daneshpanah, F. Laske, M. Wagner, K.-D. Roeth, S. Czerkas, H. Yamaguchi, N. Fujii, S. Yoshikawa, K. Kanno, H. Takamizawa
Proceedings Volume 9256, 92560F (2014) https://doi.org/10.1117/12.2072074
KEYWORDS: Photomasks, Metrology, Semiconducting wafers, Model-based design, Near field optics, Reticles, Autoregressive models, Overlay metrology, Systems modeling, Logic

Proceedings Article | 28 July 2014 Paper
Shunsuke Sato, Frank Laske, Shinji Kunitani, Tatsuhiko Kamibayashi, Akira Fuse, Naoki Takahashi, Klaus-Dieter Roeth, Slawomir Czerkas, Mehdi Daneshpanah, Yoshinori Nagaoka
Proceedings Volume 9256, 92560E (2014) https://doi.org/10.1117/12.2070399
KEYWORDS: Photomasks, Image registration, Model-based design, Semiconducting wafers, Overlay metrology, Data modeling, Metrology, Semiconductors, Data processing, Metals

Showing 5 of 18 publications
Conference Committee Involvement (3)
Dimensional Optical Metrology and Inspection for Practical Applications III
5 May 2014 | Baltimore, MD, United States
Dimensional Optical Metrology and Inspection for Practical Applications II
25 August 2013 | San Diego, California, United States
Dimensional Optical Metrology and Inspection for Practical Applications
22 August 2011 | San Diego, California, United States
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