Dr. Mehdi Daneshpanah
Director of Engineering at KLA Corp
SPIE Involvement:
Author
Area of Expertise:
Three dimensional sensing , Digital Holography , Medical imaging , Biophotonics , Display and visualization , Optical Metrology
Profile Summary

♦ Driven R&D and product development programs in semiconductor inspection and high-tech manufacturing industries with focus on systems architecture, algorithms and software.
♦ Extensive work in the area of new algorithm development and optimization for computational-optical systems. Hands on experience with 3D and high precision optical imaging / metrology systems.
♦ Experienced in system level design for highly complex computational-optical inspection tools for N10 and below.
♦ 50+ publications w/ h-index 14

Specialties: imaging system architecuture, algorithm design, mathematical and statistical modeling, optimization, advanced optical imaging, computational lithography, 3D optical imaging/display systems, digital holography, computational optics for 3D sensing, nonlinear microscopy, statistical data analysis and pattern recognition
Publications (18)

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Lithography, Inspection, 3D modeling, Scanning electron microscopy, Photoresist materials, Near field, Photomasks, Semiconducting wafers

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Reticles, Metrology, Scanners, Error analysis, Ions, Manufacturing, Image registration, Photomasks, Semiconducting wafers, Overlay metrology

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Lithography, Reticles, Metrology, Calibration, Manufacturing, Image registration, Photomasks, Beam shaping, Nanofabrication, Model-based design

Proceedings Article | 28 July 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Semiconductors, Metrology, Data modeling, Metals, Image registration, Data processing, Photomasks, Semiconducting wafers, Overlay metrology, Model-based design

Proceedings Article | 28 July 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Reticles, Metrology, Logic, Photomasks, Semiconducting wafers, Autoregressive models, Systems modeling, Overlay metrology, Model-based design, Near field optics

Showing 5 of 18 publications
Conference Committee Involvement (3)
Dimensional Optical Metrology and Inspection for Practical Applications III
5 May 2014 | Baltimore, Maryland, United States
Dimensional Optical Metrology and Inspection for Practical Applications II
25 August 2013 | San Diego, California, United States
Dimensional Optical Metrology and Inspection for Practical Applications
22 August 2011 | San Diego, California, United States
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