Dr. Meihua Shen
at
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 17, 2015
Proc. SPIE. 9428, Advanced Etch Technology for Nanopatterning IV
KEYWORDS: Oxides, Optical lithography, Etching, Ions, Silicon, Critical dimension metrology, Reactive ion etching, Semiconducting wafers, Focus stacking software, Plasma

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