Dr. Meiten Koh Profile

Dr. Meiten Koh

at Daikin Industries Ltd

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 14 May 2004 Paper

Characterization of TFE/norbornene-based fluoropolymer resist for 157-nm lithography

Takuya Hagiwara, Takamitsu Furukawa, Toshiro Itani, Kiyoshi Fujii, Takuji Ishikawa, Meiten Koh, Tetsuhiro Kodani, Tsukasa Moriya, Tsuneo Yamashita, Takayuki Araki, Minoru Toriumi, Hirokazu Aoyama

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535098

KEYWORDS: Polymers, Absorption, Lithography, Resistance, Absorbance, Line edge roughness, Fluorine, Industrial chemicals, Transparency, Chlorine

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Proceedings Article | 14 May 2004 Paper

The dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials

Takuji Ishikawa, Tetsuhiro Kodani, Meiten Koh, Tsukasa Moriya, Takayuki Araki, Hirokazu Aoyama, Tsuneo Yamashita, Minoru Toriumi, Takuya Hagiwara, Takamitsu Furukawa, Toshiro Itani, Kiyoshi Fujii

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533901

KEYWORDS: Polymers, Transparency, Lithography, Fluorine, Absorbance, Photomasks, Standards development, Phase shifts, Polymer thin films, Absorption

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Proceedings Article | 12 June 2003 Paper

Development and characterization of new 157-nm photoresists based on advanced fluorinated polymers

Tamio Yamazaki, Takamitsu Furukawa, Toshiro Itani, Takuji Ishikawa, Meiten Koh, Takayuki Araki, Minoru Toriumi, T. Kodani, Hirokazu Aoyama, Tsuneo Yamashita

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485046

KEYWORDS: Polymers, Fluorine, Lithography, Transparency, Absorption, Polymerization, Standards development, Chemical species, Photoresist developing, Vacuum ultraviolet

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Proceedings Article | 12 June 2003 Paper

Synthesis of novel fluorinated norbornene derivatives for 157-nm application

Meiten Koh, Takuji Ishikawa, Minoru Toriumi, Takayuki Araki, Tsuneo Yamashita, Hirokazu Aoyama, Tamio Yamazaki, Takamitsu Furukawa, Toshiro Itani

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485077

KEYWORDS: Polymers, Fluorine, Transparency, Absorbance, Absorption, Chemical species, Standards development, Photoresist materials, Spectroscopy, Vacuum ultraviolet

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Proceedings Article | 12 June 2003 Paper

Novel main-chain-fluorinated polymers for 157-nm photoresists

Minoru Toriumi, Meiten Koh, Takuji Ishikawa, T. Kodani, Takayuki Araki, Hirokazu Aoyama, Tsuneo Yamashita, Tamio Yamazaki, Takamitsu Furukawa, Toshiro Itani

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485085

KEYWORDS: Polymers, Transparency, Absorption, Polymerization, Resistance, Etching, Lithography, Fluorine, Standards development, Absorbance

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