Ms. Melissa Anderson
Director Product Marketing & Bus Dev at Aprio Technologies Inc
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Databases, Metals, Image processing, Silicon, Manufacturing, Inspection, Optical proximity correction, Product engineering, Model-based design

PROCEEDINGS ARTICLE | November 8, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Data modeling, Manufacturing, Photomasks, Optical proximity correction, Structural design, Model-based design, Process modeling, Resolution enhancement technologies, Design for manufacturability

PROCEEDINGS ARTICLE | November 7, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Manufacturing, Inspection, Photomasks, Optical proximity correction, Semiconducting wafers, Model-based design, Resolution enhancement technologies, Defect inspection, Design for manufacturability

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