This work describes full wafer encapsulation of released, self-assembled monolayer (SAM) coated, multi-level polysilicon surface micromachines using the anodic bonding technique. This process has been utilized to protect fragile surface micromachines from damage due to particles, moisture contamination, and post-release die handling. The anodic bonding process was optimized to ensure strong glass-to-wafer bonds, while maintaining the effectiveness of liquid-phase and vapor-phase deposited SAM coatings. The temperature, time, and voltage effects on each SAM coating was analyzed. Glass-to-silicon and glass-to-SAM coated silicon had shear strengths of approximately 18 MPa. Glass-to-polysilicon bonds had lower shear strengths of approximately 10 MPa. Bonds were hermetic to 5 X 10<SUP>-8</SUP> atm-cm<SUP>3</SUP>/s.